Silicon processing for the vlsi era, vol 1. Process technology / Wolf, Stanley ; Tauber , Richard N (2000)

Silicon processing for the vlsi era, vol 1. Process technology [texte imprimé] / Wolf, Stanley, Auteur ; Tauber , Richard N, Auteur  . -  2 éd . - Lattice Press, 2000 . - XXXVI-890 P : ill. ; 25 cm.
ISBN : 978-0-9616721-6-4
Bibliogr. Index
Langues : Anglais (eng)

Mots-clés :	Electrotechnique circuit intégrés intégration silicon vlsi
Index. décimale :	621.3.049.77 Micro-électronique.Circuits intégrés.
Note de contenu :	Contents *Silicon: single-crystal growth & wafer preparation *Crystalline defects and gettering *Vacuum technology for ulsi applications *Basics of thin films *Cleaning technology for ulsi *Chemical vapor deposition of amorphous and polycrystalline films *Silicon epitaxial film growth *Thermal oxidation of silicon *Diffusion in silicon *Ion implantation for ulsi *Aluminum thin films and physical vapor deposition in ulsi *Lithography I: optical photoresists - material properties and process technology *Lithography II: optical aligners and photomasks *Dry etching for ulsi *Multilevel metallization for ulsi *Cmos process integration *Assembly and packaging for ulsi appendices