| Titre : | Multicomponent and multilayered thin films for advanced microtechnologies : techniques, fundamentals and devices | | Type de document : | texte imprimé | | Auteurs : | Orlando Auciello, Editeur scientifique ; Jurgen Engemann, Editeur scientifique ; NATO Advanced Study Institute, Editeur scientifique | | Editeur : | Boston : Kluwer academic publishers | | Année de publication : | 1993 | | Collection : | NATO ASI series | | Sous-collection : | Series E: Applied sciences num. Vol. 234 | | Importance : | XV-633 p. | | Présentation : | ill. | | Format : | 24 cm | | ISBN/ISSN/EAN : | 978-0-7923-2265-8 | | Note générale : | Proceedings of the NATO Advanced Study Institute on Multicomponent and Multilayered Thin Films for Advanced Microtechnologies, Bad Windsheim, Germany, September 21-October 2, 1992.
Notes bibliogr. Index | | Langues : | Anglais (eng) | | Mots-clés : | Couches épaisses -- congrès
Couches ferroélectriques -- congrès
Couches multimoléculaires -- congrès
Couches minces -- Actes de congrès | | Index. décimale : | 621.382 Dispositifs électroniques utilisant les effets des corps solides. Dispositifs semi-conducteurs | | Résumé : | The synthesis of multicomponent/multilayered superconducting, conducting, semiconducting and insulating thin films has become the subject of an intensive, worldwide, interdisciplinary research effort. The development of deposition-characterization techniques and the science and technology related to the synthesis of these films are critical for the successful evolution of this interdisciplinary field of research and the implementation of the new materials in a whole new generation of advanced microdevices. This book contains the lectures and contributed papers on various scientific and technological aspects of multicomponent and multilayered thin films presented at a NATO/ASI. Compared to other recent books on thin films, the distinctive character of this book is the interdisciplinary treatment of the various fields of research related to the different thin film materials mentioned above. The wide range of topics discussed in this book include vacuum-deposition techniques, synthesis-processing, characterization, and devices of multicomponent/multilayered oxide high temperature superconducting, ferroelectric, electro-optic, optical, metallic, silicide, and compound semiconductor thin films. The book presents an unusual intedisciplinary exchange of ideas between researchers with cross-disciplinary backgrounds and it will be useful to established investigators as well as postdoctoral and graduate students. | | Note de contenu : | Contents:
* Plasma Sputter Deposition Systems: Plasma Generation, Basic Physics and Characterization.
* Technology and Application of Filamentless RF - Ion Sources in Ion Beam Sputter Deposition.
* Physics of Film Growth from the Vapor Phase.
* Techniques for the Growth of Crystalline Films by Molecular Beam Deposition.
* Discharge Density Increase for High Rate Magnetron Sputtering.
* On the Transport of Sputtered Species in Plasma Sputter-Deposition Systems.
* Influence of Sputter Gas Pressure and Substrate Bias on Intrinsic Stress and Crystallinity of Coatings Produced by Magnetron Sputtering.
* Sputter Deposition of Multicomponent Targets: What Parts of the Process Affect the Elemental Composition of the Film.
* A Proposition of a Novel Reactive Sputter-Deposition System for Synthesizing Multi-Component Materials.
... |
Multicomponent and multilayered thin films for advanced microtechnologies : techniques, fundamentals and devices [texte imprimé] / Orlando Auciello, Editeur scientifique ; Jurgen Engemann, Editeur scientifique ; NATO Advanced Study Institute, Editeur scientifique . - Kluwer academic publishers, 1993 . - XV-633 p. : ill. ; 24 cm. - ( NATO ASI series. Series E: Applied sciences; Vol. 234) . ISBN : 978-0-7923-2265-8 Proceedings of the NATO Advanced Study Institute on Multicomponent and Multilayered Thin Films for Advanced Microtechnologies, Bad Windsheim, Germany, September 21-October 2, 1992.
Notes bibliogr. Index Langues : Anglais ( eng) | Mots-clés : | Couches épaisses -- congrès
Couches ferroélectriques -- congrès
Couches multimoléculaires -- congrès
Couches minces -- Actes de congrès | | Index. décimale : | 621.382 Dispositifs électroniques utilisant les effets des corps solides. Dispositifs semi-conducteurs | | Résumé : | The synthesis of multicomponent/multilayered superconducting, conducting, semiconducting and insulating thin films has become the subject of an intensive, worldwide, interdisciplinary research effort. The development of deposition-characterization techniques and the science and technology related to the synthesis of these films are critical for the successful evolution of this interdisciplinary field of research and the implementation of the new materials in a whole new generation of advanced microdevices. This book contains the lectures and contributed papers on various scientific and technological aspects of multicomponent and multilayered thin films presented at a NATO/ASI. Compared to other recent books on thin films, the distinctive character of this book is the interdisciplinary treatment of the various fields of research related to the different thin film materials mentioned above. The wide range of topics discussed in this book include vacuum-deposition techniques, synthesis-processing, characterization, and devices of multicomponent/multilayered oxide high temperature superconducting, ferroelectric, electro-optic, optical, metallic, silicide, and compound semiconductor thin films. The book presents an unusual intedisciplinary exchange of ideas between researchers with cross-disciplinary backgrounds and it will be useful to established investigators as well as postdoctoral and graduate students. | | Note de contenu : | Contents:
* Plasma Sputter Deposition Systems: Plasma Generation, Basic Physics and Characterization.
* Technology and Application of Filamentless RF - Ion Sources in Ion Beam Sputter Deposition.
* Physics of Film Growth from the Vapor Phase.
* Techniques for the Growth of Crystalline Films by Molecular Beam Deposition.
* Discharge Density Increase for High Rate Magnetron Sputtering.
* On the Transport of Sputtered Species in Plasma Sputter-Deposition Systems.
* Influence of Sputter Gas Pressure and Substrate Bias on Intrinsic Stress and Crystallinity of Coatings Produced by Magnetron Sputtering.
* Sputter Deposition of Multicomponent Targets: What Parts of the Process Affect the Elemental Composition of the Film.
* A Proposition of a Novel Reactive Sputter-Deposition System for Synthesizing Multi-Component Materials.
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