| Titre de série : |
Silicon processing for the vlsi era, vol 1 |
| Titre : |
Process technology |
| Type de document : |
texte imprimé |
| Auteurs : |
Wolf, Stanley, Auteur ; Tauber , Richard N, Auteur |
| Mention d'édition : |
2 éd |
| Editeur : |
Lattice Press |
| Année de publication : |
2000 |
| Importance : |
XXXVI-890 P |
| Présentation : |
ill. |
| Format : |
25 cm |
| ISBN/ISSN/EAN : |
978-0-9616721-6-4 |
| Note générale : |
Bibliogr. Index |
| Langues : |
Anglais (eng) |
| Mots-clés : |
Electrotechnique circuit intégrés intégration silicon vlsi |
| Index. décimale : |
621.3.049.77 Micro-électronique.Circuits intégrés. |
| Note de contenu : |
Contents
*Silicon: single-crystal growth & wafer preparation
*Crystalline defects and gettering
*Vacuum technology for ulsi applications
*Basics of thin films
*Cleaning technology for ulsi
*Chemical vapor deposition of amorphous and polycrystalline films
*Silicon epitaxial film growth
*Thermal oxidation of silicon
*Diffusion in silicon
*Ion implantation for ulsi
*Aluminum thin films and physical vapor deposition in ulsi
*Lithography I: optical photoresists - material properties and process technology
*Lithography II: optical aligners and photomasks
*Dry etching for ulsi
*Multilevel metallization for ulsi
*Cmos process integration
*Assembly and packaging for ulsi appendices |
Silicon processing for the vlsi era, vol 1. Process technology [texte imprimé] / Wolf, Stanley, Auteur ; Tauber , Richard N, Auteur . - 2 éd . - Lattice Press, 2000 . - XXXVI-890 P : ill. ; 25 cm. ISBN : 978-0-9616721-6-4 Bibliogr. Index Langues : Anglais ( eng)
| Mots-clés : |
Electrotechnique circuit intégrés intégration silicon vlsi |
| Index. décimale : |
621.3.049.77 Micro-électronique.Circuits intégrés. |
| Note de contenu : |
Contents
*Silicon: single-crystal growth & wafer preparation
*Crystalline defects and gettering
*Vacuum technology for ulsi applications
*Basics of thin films
*Cleaning technology for ulsi
*Chemical vapor deposition of amorphous and polycrystalline films
*Silicon epitaxial film growth
*Thermal oxidation of silicon
*Diffusion in silicon
*Ion implantation for ulsi
*Aluminum thin films and physical vapor deposition in ulsi
*Lithography I: optical photoresists - material properties and process technology
*Lithography II: optical aligners and photomasks
*Dry etching for ulsi
*Multilevel metallization for ulsi
*Cmos process integration
*Assembly and packaging for ulsi appendices |
|  |
Silicon processing for the vlsi era, vol 1. Process technology (2000)
